지식재산 솔루션 & 지식재산 법률 아웃소싱 서비스
고객님의 지식재산권을 소중하게 여기고, 최상의 권리로서 확보 및 관리를 할 수 있도록 선행기술조사, 특허정보분석, 기술 사업성 및 가치평가, 라이센싱등등 최고의 지식재산 토털 서비스를 제공해 드리고 있습니다.
특허, 실용신안, 평가, 아이디어, 출원, 상표출원, 특허도우미
화학 / 바이오 / 환경
번호 : 577
작성자 : master
작성일 : 2011-12-16
조회수 : 2540
제목 : 고효율 광 나노소자 기술개발 특허동향
첨부파일 : 20111216113234_ed553.pdf
분석 배경 본 특허분석은 고효율 광 나노소자 기술을 대상으로 하였으며,산업원천기술로드맵의 취지인 Top down 과제 후보 기술 도출 및 우리나라의 전략 기술 분야를 선정하는 데에 있어서, 객관적인 데이터를 제공하고자, 특허정보로서 이를 뒷받침 할 수 있도록 지식경제부의 요청에 의해 특허청이 발주하고 한국특허정보원이 주관하는 사업이다.분석 기준 전략 핵심 원천기술을 도출하기 위하여 정량분석 이외에 특허장벽 분석 등의 심층 분석을 통해 국가R&D 투자의 우선순위를 선정 할 수 있도록 후보 핵심기술을 도출하고자, 연구개발 진입 가능성, 선행특허 회피가능성 등을 고려하여 핵심기술을 선정하였으며, 선정된 핵심 원천기술에 대해 정량적인 분석을 진행하여 산업원천기술개발의 단계별 전략을 수립하는데 객관적인 특허정보를 제공하였다. ---------------------------------------------------------------------------------------------------------------- 본 보고서는 국가연구개발 기획단계에서 특허정보를 분석하여 우리나라 고효율 광 나노소자 기술의 기 술개발 추이 및 수준을 객관적으로 파악하고 효율적인국가연구개발 정책수립을 위한 기초자료를 제공하고자, 특허청의 용역사업으로 수행하여 발간한 특허동향조사?분석 결과입니다. [고효율 광 나노소자 기술개발 특허동향中]
자료 출처: e- 특허나라
[ 더 자세한 내용을 원하는 분들을 위해 원본파일을 첨부 했습니다 ]
목차 주요 분석결과 Ⅰ. 개 요 ·············································································· 1 제 1 절 분석 배경 및 목적 ························································ 3 1. 분석 배경 ·················································································· 3 2. 분석 기준 ·················································································· 3 제 2 절 분석범위 ············································································ 4 1. 분석대상 특허 ·········································································· 4 Ⅱ. 동향분석 ········································································ 5 제 1 절 분석대상 선정 ·································································· 7 1. 분석대상 기술 ·········································································· 7 제 2 절 전 세계 고효율 나노발광소자 분야의 동향 ·············· 8 1. 고효율 나노 발광소자 분야 특허의 연도별 동향 ············ 8 2. 기술 발전주기에 따른 특허 포트폴리오 ···························· 9 3. 특허 포트폴리오 분석 ·························································· 10 제 3 절 핵심 원천기술별 특허동향 ·········································· 20 1. 고체 레이저 펌핑용 고출력 나노 발광소자의 특허동향 ···· 20 2. 파이버 레이저 펌핑용 고출력 나노 발광소자의 특허동향 ···· 23 3. EDFA 펌핑용 고출력 나노 발광소자의 특허동향 ··········· 26 4. 광대역 DWDM용 나노 발광소자 array의 특허동향 ······ 29 5. FTTH용 저가형 양자구조 반도체 레이저의 특허동향 ···· 33 6. 실리콘 포토닉스용 저가형 나노 발광소자의 특허동향 ···· 37 7. 양자 암호통신용 나노 발광소자의 특허동향 ·················· 41 8. OCT용 광대역 나노 발광소자의 특허동향 ······················ 45 9. 조명용 고휘도 저가형 나노선 발광소자의 특허동향 ···· 49 10. LCD 백라이트용 나노선 발광소자의 특허동향 ············· 53 Ⅲ. 심층분석 ······································································ 57 제 1 절 핵심 원천기술 분석 결과 ············································ 59 제 2 절 핵심 원천기술별 특허장벽 분석 ································ 61 1. 고체 레이저 펌핑용 고출력 나노 발광소자 기술 ·········· 61 2. 파이버(fiber) 레이저 펌핑용 고출력 나노 발광소자 기술 ···· 70 3. EDFA 펌핑용 고출력 나노 발광소자 기술 ······················· 78 4. 광대역 DWDM용 나노 발광소자 array 기술 ·················· 86 5. FTTH용 저가형 양자구조 반도체 레이저 기술 ··············· 98 6. 실리콘 포토닉스용 저가형 나노 발광소자 기술의 특허장 벽 분석 ·················································································· 107 7. 양자암호 통신용 나노 발광소자 기술의 특허장벽 분석 ···· 115 8. OCT용 광대역 나노발광소자 기술 ·································· 123 9. 조명용 고휘도/저가형 나노선 발광소자 기술 ·············· 132 10. LCD 백라이트용 나노선 발광소자 기술의 특허장벽 분석···· 141 11. 신호등용 나노선 발광소자 기술 ···································· 148 Ⅳ. 결 론 ·········································································· 151 제 1 절 결론 및 시사점 ·························································· 153 1. 결론 ······················································································ 153 2. 시사점 ···················································································· 154 Ⅴ. 첨 부 ·········································································· 161
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